The 29th Lithography Workshopで、招待講演を行いました

The 29th Lithography Workshop (22-25 June 2026@Sedona, AZ, USA)で、以下の招待講演を行いました。

[発表一覧 (日付順、〇は発表者)]

S6-23
Toward Next-Generation AR Glasses: Grayscale-Lithography-Assisted Nanoimprint Technology
T. Amemiya¹, T. Maekawa¹, S. Nagamatsu¹
(1.Institute of Science Tokyo)

会議HP　The 29th Lithography Workshop