SPIE Photonics West 2026 (17-22 Jan. 2026@San Francisco, CA, USA)で、以下 3件の発表を行いました。

[発表一覧 (日付順、〇は発表者)]

13821-4
NIL process using a photopolymer master mold fabricated by grayscale lithography
〇S. Nagamatsu¹, T. Maekawa¹, L. Xiang¹, J. Lee², H. Miyao², K. Otsuka², T. Amemiya¹
(1.Institute of Science Tokyo, 2.Mitsui Chemicals, Inc.)

13821-84
Proposal of AR glasses for unobstructed view to support medical procedures
〇T. Maekawa¹, Y. Wang¹, S. Nagamatsu¹, S. Noda¹, L. Xiang¹, S. Shiraga², T. Amemiya¹
(1.Institute of Science Tokyo, 2.Cellid, Inc.)

13902-42
Wafer-scale fabrication of silicon passive components using UV-nanoimprint lithography
〇Y. Nakayama¹, S. Nagamatsu¹, G. Ichisawa¹, T. Maekawa¹, R. Mori², T. Asai², Y. Fujii², D. Shiota², K. Oonou³, D. Tanabe³, T. Amemiya¹
(1.Institute of Science Tokyo, 2.TOKYO OHKA KOGYO CO.,LTD., 3.Tekscend Photomask Corp.)

また、以下のPlenary Eventにて当グループの成果が紹介されました

AR|VR|MR Session: Manufacturing
22 January 2026, 2:15 PM – 4:05 PM PST | Plenary Stage (Moscone West, Level 3) 
Unlimited Optical Design Freedom — Powered by NIL Masters
〇M. Sczyrba¹
(1.Tekscend Photomask Corp.)

会議HP　SPIE Photonics West 2026